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dc.contributor.authorKurama, Semra
dc.date.accessioned2019-10-22T16:59:17Z
dc.date.available2019-10-22T16:59:17Z
dc.date.issued2008
dc.identifier.issn1013-9826
dc.identifier.urihttps://hdl.handle.net/11421/21808
dc.description.abstractNd-doped ?-SiAlON starting composition (Nd0.33Si 9.38Al2.62O1.62N14.38) was prepared by gas pressure sintering at 1825°C for 3 hrs. In order to explore the effect of post heat treatment on the developments of elongated ?-SiAlON grains, sample was heat treated at 1800°C for 4-12 hrs. It was found that post heat treatments promoted formation of the elongated ?-SiAlON grains. The controlling mechanism of grain growth was determined via plotting on a graph the growth in width/length versus time graphics using Image Analysis method. Different growth rates were found between the length and width direction of the ?-SiAlON crystals, resulting in anisotropic grain growth in the microstructural development.en_US
dc.language.isoengen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectHeat Treatmenten_US
dc.subjectImage Analyzeen_US
dc.subjectLsw Theoryen_US
dc.subjectSialonen_US
dc.titleOptimization of ?-sialon microstructure by heat treatmenten_US
dc.typeconferenceObjecten_US
dc.relation.journalKey Engineering Materialsen_US
dc.contributor.departmentAnadolu Üniversitesi, Mühendislik Fakültesi, Malzeme Bilimi ve Mühendisliği Bölümüen_US
dc.identifier.volume368-372 PART 1en_US
dc.identifier.startpage891en_US
dc.identifier.endpage893en_US
dc.relation.publicationcategoryKonferans Öğesi - Uluslararası - Kurum Öğretim Elemanıen_US
dc.contributor.institutionauthorKurama, Semra


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